Wholesale customized impurity-free round shape quartz polishing sheet with 99.99% SiO₂ content, density 2.2g/cm³, hardness 6.6, working temperature 1100℃, and melting point 1732℃. Supports punching/cutting processing and free samples for semiconductor applications.
High Precision CNC Drilled Optical Fused Silica Quartz Glass Plate with 99.99% SiO₂ content, 1732℃ melting point, and 1100℃ working temperature. Custom manufacturing with punching/cutting services and free samples available for semiconductor applications.
High-temperature resistant quartz plate with 1150℃ working temperature, >92% light transmittance, and 99.99% SiO2 purity. Available in 0.5-100mm thickness with custom manufacturing options for semiconductor, laboratory, and furnace applications.
Factory custom high purity 99.99% transparent quartz plate with >92% light transmittance, JGS1/JGS2 standards, working temperature up to 1150℃, available in 0.5-100mm thickness. Custom manufacturing options for semiconductor and optical applications with strong corrosion resistance and electrical insulation.
Factory direct polished quartz plates with 99.99% SiO2 purity, 1150℃ working temperature, >92% light transmittance, and 0.5-100mm thickness. Custom sizes available with JGS standards, ideal for semiconductor, optics, and industrial applications requiring high heat resistance and durability.
High Transparent Polishing Fused Silica Quartz Glass Bottle for Chemistry Laboratory Experiment. Features 99.99% SiO₂ content, 1732℃ melting point, 1100℃ working temperature, and 6.6 hardness. Ideal for laboratory research, semiconductor processes, and university teaching applications.