Material | SIO2>99.99% |
---|---|
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Melt Point | 1750-1850℃ |
Working Temperature | 1110℃ |
Type | Quartz Wafer Carrier |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Bending, Welding, Punching, Polishing |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Mixed |
Processing Service | Bending, Welding, Punching, Polishing |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Arc |
Processing Service | Bending, Welding, Punching, Polishing |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square/round |
Processing Service | Bending, Welding, Punching, Polishing |
Sio2 | 99.99% |
---|---|
Working Temparature | 1200℃ |
Melt Point | 1750-1850℃ |
Usage | Laboratory,biology,medical |
Color | Transparent |
Material | SIO2>99.99% |
---|---|
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Melt Point | 1750-1850℃ |
Working Temperature | 1110℃ |
Product Name | Laboratory Reagent Bottle |
---|---|
Material | SIO2>99.9% |
Density | 2.2g/cm3 |
Acid Tolerance | 30 Times Than Ceramics,150 Times Than Stainless Steel |
Melt Point | 1750℃ |
Product Name | Laboratory Reagent Bottle |
---|---|
Material | SIO2>99.9% |
Density | 2.2g/cm3 |
Working Temperature | 1100℃ |
Acid Tolerance | 30 Times Than Ceramics,150 Times Than Stainless Steel |
Name | Fused Silica Quartz Flange |
---|---|
Feature | Accurate Dimension |
Application | Heater |
Density | 2.2g/cm3 |
Working Temperature | 1100℃ |