| Product Name | Quartz Glass Crucible |
|---|---|
| Material | SIO2>99.99% |
| Density | 2.2g/cm3 |
| Hardness | Morse 6.5 |
| Melt Point | 1750-1850℃ |
| Product Name | Quartz Glass Crucible |
|---|---|
| Material | SIO2>99.99% |
| Density | 2.2g/cm3 |
| Hardness | Morse 6.5 |
| Melt Point | 1750-1850℃ |
| Product Name | Quartz Glass Crucible |
|---|---|
| Material | SIO2>99.99% |
| Density | 2.2g/cm3 |
| Hardness | Morse 6.5 |
| Melt Point | 1750-1850℃ |
| Quartz Name | Quartz Glass Plate |
|---|---|
| Material | 99.99% |
| Light Transmittance | 92% |
| Density | 2.2g/cm3 |
| Working Temparature | 1100℃ |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |