Product Name | Quartz Glass Plate |
---|---|
Material | SIO2 |
Hardness | Morse 6.5 |
Working Temperature | 1100℃ |
Surface Quality | 20/40 Or 40/60 |
Keyword | Science Lab Glassware |
---|---|
Material | Fused Silicon |
Working Temperature | 1100℃ |
Acid Tolerance | 30 Times Than Ceramics |
Hardness | Morse 6.5 |
Product Name | Quartz Glass Crucible |
---|---|
Material | SIO2>99.99% |
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Melt Point | 1750-1850℃ |
Quartz Name | Quartz Glass Plate |
---|---|
Material | 99.99% |
Light Transmittance | 92% |
Density | 2.2g/cm3 |
Working Temparature | 1100℃ |
Product Name | Precision Glass Machining |
---|---|
Material | SIO2 |
Hardness | Morse 6.5 |
Working Temperature | 1100℃ |
Surface Quality | 20/40 Or 40/60 |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Punching, Cutting |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Punching, Cutting |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Punching, Cutting |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Punching, Cutting |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Punching, Cutting |