Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Bending, Welding, Punching, Cutting, Polishing |
Sio2 | 99.99% |
---|---|
Working Temparature | 1200℃ |
Melt Point | 1750-1850℃ |
Usage | Laboratory,biology,medical |
Color | Transparent |
Product Name | Experimental Quartz Reactors Iso9001 Science Lab Glassware |
---|---|
Material | Fused Silicon |
Working Temperature | 1100℃ |
Acid Tolerance | 30 Times Than Ceramics |
Hardness | Morse 6.5 |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Bending, Welding, Punching, Cutting, Polishing |
Material | SIO2>99.99% |
---|---|
Density | 2.2g/cm3 |
Light Transimittance | 92% |
Hardness | Morse 6.5 |
Working Temparature | 1100℃ |
Material | SIO2>99.99% |
---|---|
Density | 2.2g/cm3 |
Light Transimittance | 92% |
Hardness | Morse 6.5 |
Working Temparature | 1100℃ |
Material | SIO2>99.99% |
---|---|
Density | 2.2g/cm3 |
Light Transimittance | 92% |
Hardness | Morse 6.5 |
Working Temparature | 1100℃ |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Bending, Welding, Punching, Polishing |
Type | Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Bending, Welding, Punching, Polishing |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Bending, Welding, Punching, Polishing |