Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Punching, Cutting |
Type | Clear Quartz Plate |
---|---|
Application | Semiconductor, Optical |
Thickness | 0.5-100mm |
Shape | Square |
Processing Service | Punching, Cutting |
Product Name | Quartz Glass Plate |
---|---|
Material | SIO2>99.99% |
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Working Temparature | 1150℃ |
Product Name | Quartz Glass Plate |
---|---|
Material | SIO2>99.99% |
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Light Transmittance | 92% |
Product Name | Quartz Glass Plate |
---|---|
Material | SIO2>99.99% |
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Working Temparature | 1150℃ |
Product Name | Quartz Glass Plate |
---|---|
Material | SIO2>99.99% |
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Working Temparature | 1150℃ |
Product Name | Quartz Glass Plate |
---|---|
Material | SIO2>99.99% |
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Working Temparature | 1150℃ |
Product Name | Quartz Glass Plate |
---|---|
Material | SIO2>99.99% |
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Working Temparature | 1150℃ |
Product Name | Quartz Glass Plate |
---|---|
Material | SIO2>99.99% |
Density | 2.2g/cm3 |
Hardness | Morse 6.5 |
Working Temparature | 1150℃ |
Product Name | Fused Silica Capillary |
---|---|
Material | SIO2>99.99% |
ID | 0.1-2mm |
Wall Thickness | 0.1-5mm |
Light Transmittance | >92% |