Large Diameter Fused Silica Tube High Temperature Resistant Quartz Glass Tube for Industrial Furnace
Product Details
| Processing Service: | Punching Cutting | Working Temperature: | 1100℃ |
|---|---|---|---|
| OD: | 10-10000mm | Product Name: | Quartz Tube |
| Annealing Point: | 1180℃ | SiO₂ Content: | 99.99% |
| Size: | Customized | Material: | SIO2 |
| Density: | 2.2g/cm3 | Sample: | Support Free Sample Production |
| Color: | Clear Transparent | Melting Point: | 1732℃ |
| Application: | Semiconductor, High-temperature Furnaces,laboratory Quartz Reactors | ||
| Highlight |
Large diameter fused silica tube,High temperature resistant quartz glass tube,Quartz glass tube for industrial furnace |
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Product Description
| Brand | Shengfan |
|---|---|
| Product Name | Quartz Glass Tube |
| SiO₂ Content | 99.99% |
| Density | 2.2 g/cm³ |
| Hardness (Moh's Scale) | 6.6 |
| Melting Point | 1732℃ |
| Working Temperature | 1100℃ |
| Annealing Point | 1180℃ |
| Softening Point | 1630℃ |
- High-temperature furnaces, semiconductor diffusion and annealing equipment
- Laboratory quartz reactors and vacuum reaction systems
- Photovoltaic & optical fiber high-temperature processing equipment
Product Highlights
Large diameter fused silica quartz tube with 99.99% SiO₂ purity, working temperature up to 1100℃. Custom sizes from 10-10000mm OD for semiconductor, high-temperature furnaces, and laboratory applications. Free samples available.
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