| Prodcut Name | Quartz Glass Crucible |
|---|---|
| Sio2 | 99.99% |
| Working Temparature | 1200℃ |
| Melt Point | 1750-1850℃ |
| Usage | Laboratory,biology,medical |
| Material | SIO2>99.99% |
|---|---|
| Density | 2.2g/cm3 |
| Hardness | Morse 6.5 |
| Melt Point | 1750-1850℃ |
| Working Temperature | 1110℃ |
| Product Name | Quartz Urn |
|---|---|
| Material | SIO2>99.99% |
| Density | 2.2g/cm3 |
| Hardness | Morse 6.5 |
| Melt Point | 1750-1850℃ |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Round |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Round |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Round |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Round |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |