| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Bending, Welding, Punching, Cutting |
| Type | Clear Quartz Plate |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |
| Type | Clear Quartz Tube |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Circular |
| Processing Service | Bending, Welding, Punching, Polishing |
| Type | Clear Quartz Tube |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 1-100mm |
| Shape | Square |
| Processing Service | Punching, Cutting |
| Sio2 | 99.99% |
|---|---|
| Working Temparature | 1200℃ |
| Melt Point | 1750-1850℃ |
| Usage | Laboratory,biology,medical |
| Color | Transparent |
| Type | Quartz Wafer Carrier |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Square |
| Processing Service | Bending, Welding, Punching, Polishing |
| Type | Clear Quartz Tube |
|---|---|
| Application | Semiconductor, Optical |
| Thickness | 0.5-100mm |
| Shape | Circular |
| Processing Service | Bending, Welding, Punching, Polishing |
| Material | Fused Silicon |
|---|---|
| Working Temperature | 1250℃ |
| Acid Tolerance | 30 Times Than Ceramics |
| Hardness | Morse 6.5 |
| Application | Laboratory Test |
| Product Name | Perforated Quartz Glass |
|---|---|
| Material | SIO2 |
| Hardness | Morse 6.5 |
| Working Temperature | 1100℃ |
| Surface Quality | 20/40 Or 40/60 |
| Product Name | Perforated Quartz Glass |
|---|---|
| Material | SIO2 |
| Hardness | Morse 6.5 |
| Working Temperature | 1100℃ |
| Surface Quality | 20/40 Or 40/60 |